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Principles and applications of electron beam lithography

19 Apr 2018   16:15-17:45

Electron Beam Lithography is an enabling technology in nano research labs. The electron beam is used to define structures on nano and micro scale.
The presentation provides an introduction into the principle of the (resist based and mask less) lithography process and will explain basics of instrumentation.
Emphasis will be put on the applications of focused electron beam lithography in research.
Examples from various fields including electronics (high speed transistors), photonics (lasers for high data rate communication), new “quantum devices” will be presented.

The presenter is with Raith - a leading precision technology solution provider for electron beam lithography, focused ion beam (FIB) tools, nano engineering and reverse engineering applications.

Place
T2:D3-209
Organizer
Katedra fyziky FEL
Contact person
Ing. Vratislav Fabián, Ph.D., fabiav1@fel.cvut.cz, + 420 2 2435 2327
More information
https://fyzika.fel.cvut.cz/cs/fyzikalni-ctvrtky/